검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Complementary exposure of 70 nm SoC devices in electron projection lithography Yamashita H, Amemiya I, Takeuchi K, Masaoka H, Takahashi K, Ikeda A, Kuroki Y, Yamabe M Journal of Vacuum Science & Technology B, 21(6), 2645, 2003 |
| 2 |
Complementary mask pattern split for 8 in stencil masks in electron projection lithography Yamashita H, Takahashi K, Amemiya I, Takeuchi K, Masaoka H, Takenaka H, Yamabe M Journal of Vacuum Science & Technology B, 20(6), 3015, 2002 |
| 3 |
Mask split algorithm for stencil mask in electron projection lithography Yamashita H, Takeuchi K, Masaoka H Journal of Vacuum Science & Technology B, 19(6), 2478, 2001 |