화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Templated Electrochemical Synthesis of Titania Nanopillars on Conductive Substrates
Chen Y, Park SM, Kim HC, McVittie JP, Ting C, Nish Y
Journal of the Electrochemical Society, 157(10), E155, 2010
2 Modeling and simulation of feature-size-dependent etching of metal stacks
Abdollahi-Alibeik S, Zheng J, McVittie JP, Saraswat KC, Gabriel CT, Abraham SC
Journal of Vacuum Science & Technology B, 19(1), 179, 2001
3 Analysis of injection current through thin gate oxide during metal etch
Kinoshita T, Krishnan S, Dostalik WW, McVittie JP
Journal of Vacuum Science & Technology B, 19(2), 403, 2001
4 Analytical modeling of silicon etch process in high density plasma
Abdollahi-Alibeik S, McVittie JP, Saraswat KC, Sukharev V, Schoenborn P
Journal of Vacuum Science & Technology A, 17(5), 2485, 1999
5 Abatement of perfluorocarbons with an inductively coupled plasma reactor
Liao MY, Wong K, McVittie JP, Saraswat KC
Journal of Vacuum Science & Technology B, 17(6), 2638, 1999
6 Method for angular sputter yield extraction for high-density plasma chemical vapor deposition simulators
Kapur P, Bang DS, McVittie JP, Saraswat KC, Mountsier T
Journal of Vacuum Science & Technology B, 16(3), 1123, 1998
7 Notching as an Example of Charging in Uniform High-Density Plasmas
Kinoshita T, Hane M, Mcvittie JP
Journal of Vacuum Science & Technology B, 14(1), 560, 1996
8 Effect of Wafer Temperature During Plasma Exposure on Charging Damage
Ma SM, Mcvittie JP
Journal of Vacuum Science & Technology B, 14(1), 566, 1996
9 The Effect of the Presheath on the Ion Angular-Distribution at the Wafer Surface
Zheng J, Brinkmann RP, Mcvittie JP
Journal of Vacuum Science & Technology A, 13(3), 859, 1995
10 Effect of Plasma Overetch of Polysilicon on Gate Oxide Damage
Gabriel CT, Mcvittie JP
Journal of Vacuum Science & Technology A, 13(3), 900, 1995