검색결과 : 1건
No. | Article |
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1 |
Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness La YH, Park SM, Meagley RP, Leolukman M, Gopalan P, Nealey PF Journal of Vacuum Science & Technology B, 25(6), 2508, 2007 |