검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Detailed chemical kinetic mechanism for surrogates of alternative jet fuels Naik CV, Puduppakkam KV, Modak A, Meeks E, Wang YL, Feng QY, Tsotsis TT Combustion and Flame, 158(3), 434, 2011 |
| 2 |
Modeling the plasma chemistry of C2F6 and CHF3 etching of silicon dioxide, with comparisons to etch rate and diagnostic data Ho P, Johannes JE, Buss RJ, Meeks E Journal of Vacuum Science & Technology A, 19(5), 2344, 2001 |
| 3 |
Modeling plasma chemistry for microelectronics manufacturing Meeks E, Ho P Thin Solid Films, 365(2), 334, 2000 |
| 4 |
Modeling of SiO2 deposition in high density plasma reactors and comparisons of model predictions with experimental measurements Meeks E, Larson RS, Ho P, Apblett C, Han SM, Edelberg E, Aydil ES Journal of Vacuum Science & Technology A, 16(2), 544, 1998 |
| 5 |
Simulations of BCl3/Cl-2/Ar plasmas with comparisons to diagnostic data Meeks E, Ho P, Ting AL, Buss RJ Journal of Vacuum Science & Technology A, 16(4), 2227, 1998 |
| 6 |
Modeling analysis for the optimization of diamond deposition in a stagnation-flow flame reactor Hahn DW, BuiPham MN, Meeks E Combustion Science and Technology, 126(1-6), 175, 1997 |
| 7 |
Modeling Chemical Downstream Etch Systems for NF3/O-2 Mixtures Meeks E, Larson RS, Vosen SR, Shon JW Journal of the Electrochemical Society, 144(1), 357, 1997 |
| 8 |
Simulation of Chemical Downstream Etch Systems - Correlation of the Effects of Operating-Conditions on Wafer Etch Rate and Uniformity Vosen SR, Meeks E, Larson RS, Shon JW Journal of the Electrochemical Society, 144(4), 1514, 1997 |
| 9 |
Effects of Atomic Chlorine Wall Recombination - Comparison of a Plasma Chemistry Model with Experiment Meeks E, Shon JW, Ra Y, Jones P Journal of Vacuum Science & Technology A, 13(6), 2884, 1995 |