검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Reducing the pattern redundancy in optical proximity correction modeling by analyzing the pattern linearity Li JL, Zhang L, Yan QL, Melvin LS, Lin C, Su E, Tang N Journal of Vacuum Science & Technology B, 28(6), C6J19, 2010 |
| 2 |
Model based optical proximity correction runtime saving with multisegment solver Li JL, Li XH, Deeth S, Lugg R, Melvin LS Journal of Vacuum Science & Technology B, 27(6), 2972, 2009 |
| 3 |
Transferring optical proximity correction effects into a process model Li JL, Yan QL, Melvin LS Journal of Vacuum Science & Technology B, 26(5), 1808, 2008 |
| 4 |
Abbe singular-value decomposition: Compact Abbe's kernel generation for microlithography aerial image simulation using singular-value decomposition method Chen CCP, Gurhanli A, Chiang TY, Hong JJ, Melvin LS Journal of Vacuum Science & Technology B, 26(6), 2322, 2008 |
| 5 |
Exploration of etch step interactions in the dual patterning process for process modeling Melvin LS, Ward BS, Song H, Rhie SU, Lucas KD, Wiaux V, Verhaegen S, Maenhoudt M Journal of Vacuum Science & Technology B, 26(6), 2434, 2008 |
| 6 |
Study of the assist features effect on the through focus behavior in isoline with an innovative method Li JL, Yan QL, Melvin LS Journal of Vacuum Science & Technology B, 25(6), 2301, 2007 |
| 7 |
Generation of isofocal target patterns using process modeling during optical proximity correction Melvin LS, Croffie E, Biswas A Journal of Vacuum Science & Technology B, 24(6), 2815, 2006 |
| 8 |
Use of optical defocus components to investigate and improve pattern spatial frequency characteristics for more robust layouts Melvin LS, Shiely JP, Yan QL Journal of Vacuum Science & Technology B, 23(6), 2631, 2005 |