화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 High selectivity Inductively Coupled Plasma etching of GaAs over InGaP
Hays DC, Cho H, Lee JW, Devre MW, Reelfs BH, Johnson D, Sasserath JN, Meyer LC, Toussaint E, Ren F, Abernathy CR, Pearton SJ
Applied Surface Science, 156(1-4), 76, 2000
2 Study of NH3 plasma damage on GaAs Schottky diode in inductively coupled plasma system
Meyer LC, Lee JW, Johnson D, Huang M, Ren F, Anderson TJ, LaRoche JR, Lothian JR, Abernathy CR, Pearton SJ
Journal of the Electrochemical Society, 146(7), 2717, 1999