검색결과 : 8건
No. | Article |
---|---|
1 |
Depth profiling of ultrathin films using medium energy ion scattering Kim J, Lennard WN, McNorgan CP, Hendriks J, Mitchell IV, Landheer D, Gredley J Current Applied Physics, 3(1), 75, 2003 |
2 |
Implantation induced selective chemical etching of indium phosphide Simpson TW, Gallivan PA, Mitchell IV Electrochemical and Solid State Letters, 4(3), G26, 2001 |
3 |
Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering Ladheer D, Ma P, Lennard WN, Mitchell IV, McNorgan C Journal of Vacuum Science & Technology A, 18(5), 2503, 2000 |
4 |
Lateral selectivity of ion-induced quantum well intermixing Haysom JE, Poole PJ, Feng Y, Koteles ES, He JJ, Charbonneau S, Goldberg RD, Mitchell IV Journal of Vacuum Science & Technology A, 16(2), 817, 1998 |
5 |
Reduced 980 nm laser facet absorption by band gap shifted extended cavities Piva PG, Goldberg RD, Mitchell IV, Fafard S, Dion M, Buchanan M, Charbonneau S, Hillier G, Miner C Journal of Vacuum Science & Technology B, 16(4), 1790, 1998 |
6 |
Characterization of Carbon and Carbon Nitride Thin-Films Using Time-of-Flight Secondary-Ion Mass-Spectrometry Huang LJ, Hung Y, Chang S, Massoumi GR, Lennard WN, Mitchell IV Journal of Vacuum Science & Technology A, 15(4), 2196, 1997 |
7 |
Structure of the Sinx/GaAs (110) Interface Modified with Ultrathin Si and Sulfur Passivation Huang LJ, Lau WM, Tang HT, Lennard WN, Mitchell IV, Landheer D, Baribeau JM, Ingrey S Journal of Vacuum Science & Technology B, 14(4), 2895, 1996 |
8 |
Analysis and Removal of Impurities and Defects in Reactive Ion Etched Silicon Using a Novel Depth-Profiling Technique Chang WH, Huang LJ, Lau WM, Mitchell IV, Abraham T, King M Journal of Vacuum Science & Technology A, 12(4), 2357, 1994 |