검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Cleaning technology for EUV multilayer mirror using atomic hydrogen generated with hot wire Motai K, Oizumi H, Miyagaki S, Nishiyama I, Izumi A, Ueno T, Namiki A Thin Solid Films, 516(5), 839, 2008 |
| 2 |
Performance and quality analysis of Mo-Si multilayers formed by ion-beam and magnetron sputtering for extreme ultraviolet lithography Hiruma K, Miyagaki S, Yanianashi H, Tanaka Y, Nishiyama I Thin Solid Films, 516(8), 2050, 2008 |
| 3 |
Effect of interface treatment with assisted ion beam on Mo-Si multilayer formation for mask blanks for extreme ultraviolet lithography Hiruma K, Miyagaki S, Yamaguchi A, Nishiyama I Journal of Vacuum Science & Technology B, 25(5), 1554, 2007 |
| 4 |
Influence of glass substrate surface roughness on extreme ultraviolet reflectivity of Mo/Si multilayer Miyagaki S, Yamanashi H, Yamaguchi A, Nishiyama L Journal of Vacuum Science & Technology B, 22(6), 3063, 2004 |