화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Properties of thermally annealed ruthenium thin films grown on seed layers in a low-temperature selective deposition region
Vasilyev VY, Mogilnikov KP, Song YW
Current Applied Physics, 9(2), E148, 2009
2 Surface Selective Growth of Ruthenium Films under Low-Temperature Pulsed CVD Conditions
Vasilyev VY, Mogilnikov KP, Song YW
Electrochemical and Solid State Letters, 11(12), D89, 2008
3 Nucleation and Growth of Pulsed CVD Ru Films from Tricarbonyl[eta(4)-cyclohexa-1,3-diene]ruthenium
Vasilyev VY, Mogilnikov KP, Song YW
Journal of the Electrochemical Society, 155(12), D763, 2008
4 Structural characterization of mesoporous organosilica films for ultralow-k dielectrics
de Theije FK, Balkenende AR, Verheijen MA, Baklanov MR, Mogilnikov KP, Furukawa Y
Journal of Physical Chemistry B, 107(18), 4280, 2003
5 Determination of Young's modulus of porous low-k films by ellipsometric porosimetry
Mogilnikov KP, Baklanov MR
Electrochemical and Solid State Letters, 5(12), F29, 2002
6 Determination of pore size distribution in thin films by ellipsometric porosimetry
Baklanov MR, Mogilnikov KP, Polovinkin VG, Dultsev FN
Journal of Vacuum Science & Technology B, 18(3), 1385, 2000