검색결과 : 2건
No. | Article |
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1 |
A comparative study of low dielectric constant barrier layer, etch stop and hardmask films of hydrogenated amorphous Si-(C, O, N) Wang YH, Moitreyee MR, Kumar R, Shen L, Zeng KY, Chai JW, Pan JS Thin Solid Films, 460(1-2), 211, 2004 |
2 |
The mechanical properties of ultra-low-dielectric-constant films Wang YH, Moitreyee MR, Kumar R, Wu SY, Xie JL, Yew P, Subramanian B, Shen L, Zeng KY Thin Solid Films, 462-63, 227, 2004 |