화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 A comparative study of low dielectric constant barrier layer, etch stop and hardmask films of hydrogenated amorphous Si-(C, O, N)
Wang YH, Moitreyee MR, Kumar R, Shen L, Zeng KY, Chai JW, Pan JS
Thin Solid Films, 460(1-2), 211, 2004
2 The mechanical properties of ultra-low-dielectric-constant films
Wang YH, Moitreyee MR, Kumar R, Wu SY, Xie JL, Yew P, Subramanian B, Shen L, Zeng KY
Thin Solid Films, 462-63, 227, 2004