1 |
Joining of two different ceramic nanomaterials for bottom-up fabrication of heterojunction devices Rajbhar MK, Das P, Satpati B, Moller W, Facsko S, Bottger R, Ramgir N, Chatterjee S Applied Surface Science, 478, 651, 2019 |
2 |
Numerical and experimental study on the deposition of nanoparticles in an extrathoracic oral airway model Krause F, Wenk A, Lacor C, Kreyling WG, Moller W, Verbanck S Journal of Aerosol Science, 57, 131, 2013 |
3 |
CHEMSAFE - a database for appraised safety-technological parameters Molnarne M, Moller W Chemie Ingenieur Technik, 81(1-2), 45, 2009 |
4 |
A generator for the production of radiolabelled ultrafine carbonaceous particles for deposition and clearance studies in the respiratory tract Moller W, Felten K, Seitz J, Sornmerer K, Takenaka S, Wiebert P, Philipson K, Svartengren M, Kreyling WG Journal of Aerosol Science, 37(5), 631, 2006 |
5 |
Plasma influence on the properties and structure of indium tin oxide films produced by reactive middle frequency pulsed magnetron sputtering Rogozin A, Vinnichenko M, Shevchenko N, Kolitsch A, Moller W Thin Solid Films, 496(2), 197, 2006 |
6 |
In situ x-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti-Al-N thin films Beckers M, Schell N, Martins RMS, Mucklich A, Moller W Journal of Vacuum Science & Technology A, 23(5), 1384, 2005 |
7 |
Synthesis of carbon nitride thin films by low-energy ion beam assisted evaporation: on the mechanisms for fullerene-like microstructure formation Gago R, Neidhardt J, Vinnichenko M, Kreissig U, Czigany Z, Kolitsch A, Hultman L, Moller W Thin Solid Films, 483(1-2), 89, 2005 |
8 |
Depth profiling of ZrO2/SiO2/Si stacks - a TOF-SIMS and computer simulation study Ignatova VA, Conard T, Moller W, Vandervorst W, Gijbels R Applied Surface Science, 231-2, 603, 2004 |
9 |
Effect of deposition parameters on properties of ITO films prepared by reactive middle frequency pulsed dual magnetron sputtering Rogozin AI, Vinnichenko MV, Kolitsch A, Moller W Journal of Vacuum Science & Technology A, 22(2), 349, 2004 |
10 |
Stress measurement and stress relaxation during magnetron sputter deposition of cubic boron nitride thin films Abendroth B, Gago R, Kolitsch A, Moller W Thin Solid Films, 447, 131, 2004 |