검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Solid phase growth of NiSi in polycrystalline Si on SiO2 with Cl plasma containing NiCl Kanomata K, Momiyama K, Kubota S, Suzuki T, Hirose F Applied Surface Science, 268, 141, 2013 |
| 2 |
IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor Hirose F, Kinoshita Y, Kanomata K, Momiyama K, Kubota S, Hirahara K, Kimura Y, Niwano M Applied Surface Science, 258(19), 7726, 2012 |
| 3 |
In Situ Observation of Structural Change in N719 Dye Molecule in Dye Sensitized Solar Cells with a Light Exposure and a Heat Treatment Yoshida C, Nakajima S, Shoji Y, Itoh E, Momiyama K, Kanomata K, Hirose F Journal of the Electrochemical Society, 159(11), H881, 2012 |
| 4 |
Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor Degai M, Kanomata K, Momiyama K, Kubota S, Hirahara K, Hirose F Thin Solid Films, 525, 73, 2012 |
| 5 |
Solid-phase growth of beta-FeSi2 in thick Fe film on Si(111) substrates Momiyama K, Kanomata K, Suzuki T, Kubota S, Hirose F Thin Solid Films, 525, 208, 2012 |
| 6 |
Tungsten Deposition by Metal-Chloride-Reduction Chemical Vapor Deposition Hirose F, Watanabe T, Shibata A, Momiyama K, Suzuki T, Miya H Electrochemical and Solid State Letters, 14(7), H251, 2011 |