검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Moisture-induced material instability of porous organosilicate glass Chang TC, Chen CW, Liu PT, Mor YS, Tsai HM, Tsai TM, Yan ST, Tu CH, Tseng TY, Sze SM Electrochemical and Solid State Letters, 6(4), F13, 2003 |
| 2 |
Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology Chang TC, Tsai TM, Liu PT, Mor YS, Chen CW, Sheu JT, Tsengb TY Electrochemical and Solid State Letters, 6(5), G69, 2003 |
| 3 |
Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003) Chang TC, Tsai TM, Liu PT, Mor YS, Chen CW, Sheu JT, Tseng TY Electrochemical and Solid State Letters, 6(7), L3, 2003 |
| 4 |
Effective strategy for porous organosilicate to suppress oxygen ashing damage Liu PT, Chang TC, Mor YS, Chen CW, Tsai TM, Chu CJ, Pan FM, Sze SM Electrochemical and Solid State Letters, 5(3), G11, 2002 |
| 5 |
Recovering dielectric loss of low dielectric constant organic siloxane during the photoresist removal process Chang TC, Mor YS, Liu PT, Tsai TM, Chen CW, Mei YJ, Sze SM Journal of the Electrochemical Society, 149(8), F81, 2002 |
| 6 |
Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processing Chang TC, Mor YS, Liu PT, Tsai TM, Chen CW, Chu CJ, Pan FM, Lur W, Sze SM Journal of the Electrochemical Society, 149(10), F145, 2002 |
| 7 |
Effective repair to ultra-low-k dielectric material (k-2.0) by hexamethyidisilazane treatment Mor YS, Chang TC, Liu PT, Tsai TM, Chen CW, Yan ST, Chu CJ, Wu WF, Pan FM, Lur W, Sze SM Journal of Vacuum Science & Technology B, 20(4), 1334, 2002 |
| 8 |
Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment Chang TC, Liu PT, Mor YS, Tsai TM, Chen CW, Mei YJ, Pan FM, Wu WF, Sze SM Journal of Vacuum Science & Technology B, 20(4), 1561, 2002 |
| 9 |
The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposure Chang TC, Tsai TM, Liu PT, Mor YS, Chen CW, Mei YJ, Sheu JT, Tseng TY Thin Solid Films, 420-421, 403, 2002 |
| 10 |
Improvement in integration issues for organic low-k hybrid-organic-siloxane-polymer Liu PT, Chang TC, Su H, Mor YS, Yang YL, Chung H, Hou J, Sze SM Journal of the Electrochemical Society, 148(2), F30, 2001 |