검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching Smith CJM, Murad SK, Krauss TF, De la Rue RM, Wilkinson CDW Journal of Vacuum Science & Technology B, 17(1), 113, 1999 |
| 2 |
Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography Zhou H, Midha A, Mills G, Thoms S, Murad SK, Weaver JMR Journal of Vacuum Science & Technology B, 16(1), 54, 1998 |
| 3 |
Can dry-etching systems be designed for low damage ab initio? Deng LG, Rahman M, Murad SK, Boyd A, Wilkinson CDW Journal of Vacuum Science & Technology B, 16(6), 3334, 1998 |
| 4 |
Artificial dielectric optical structures: A challenge for nanofabrication Giaconia C, Torrini R, Murad SK, Wilkinson CDW Journal of Vacuum Science & Technology B, 16(6), 3903, 1998 |
| 5 |
Effects of O-2 Addition to Sicl4/Sif4 and the Thickness of the Capping Layer on Gate Recess Etching of GaAs-Pseudomorphic High-Electron-Mobility Transistors Murad SK, Cameron NI, Beaumont SP, Wilkinson CD Journal of Vacuum Science & Technology B, 14(6), 3668, 1996 |
| 6 |
Selective Reactive Ion Etching of InGaAs and InP over InAlAs in Sicl4/Sif4/HBr Plasmas Murad SK, Beaumont SP, Holland M, Wilkinson CD Journal of Vacuum Science & Technology B, 13(6), 2344, 1995 |
| 7 |
Very-Low Damage Etching of GaAs Murad SK, Wilkinson CD, Wang PD, Parkes W, Sotomayortorres CM, Cameron N Journal of Vacuum Science & Technology B, 11(6), 2237, 1993 |