검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Electron-beam induced carbon deposition used as a mask for cadmium sulfide deposition on Si(100) Djenizian T, Petite B, Santinacci L, Schmuki P Electrochimica Acta, 47(6), 891, 2001 |
| 2 |
High resolution organic resists for charged particle lithography Ochiai Y, Manako S, Fujita J, Nomura E Journal of Vacuum Science & Technology B, 17(3), 933, 1999 |
| 3 |
Accurate critical dimension control by using an azide/novolak resist process for electron-beam lithography Yamamoto J, Uchino S, Ohta H, Yoshimura T, Murai F Journal of Vacuum Science & Technology B, 15(6), 2868, 1997 |
| 4 |
Poly(4-(bis(Trimethylsilyl)Methyl)Styrene) for an Electron-Beam Resist with a High-Resolution Kato N, Takeda K, Nagasaki Y, Kato M Industrial & Engineering Chemistry Research, 33(2), 417, 1994 |
| 5 |
Functionalization of Polysilsesquioxanes Puyenbroek R, Vandegrampel JC, Rousseeuw BA, Vanderdrift EW Polymer, 35(14), 3131, 1994 |
| 6 |
Synthesis of Poly(4-(bis(Trimethylstannyl)Methyl)Styrene) and Its Properties for Electron-Beam Resist Kato N, Yamazaki N, Nagasaki Y, Kato M Polymer Bulletin, 32(1), 55, 1994 |