| 1 |
Effects of sputtering pressure on microstructure and mechanical properties of ZrN films deposited by magnetron sputtering
Lin SC, Zhang J, Zhu RH, Fu SC, Yun DQ
Materials Research Bulletin, 105, 231, 2018 |
| 2 |
Femtosecond laser-induced periodic surface structures on titanium nitride coatings for tribological applications
Bonse J, Kirner SV, Koter R, Pentzien S, Spaltmann D, Kruger J
Applied Surface Science, 418, 572, 2017 |
| 3 |
Effect of nitrogen surrounding gas and plasma assistance on nitrogen incorporation in a-C:N films by femtosecond pulsed laser deposition
Bourquard F, Maddi C, Donnet C, Loir AS, Barnier V, Wolski K, Garrelie F
Applied Surface Science, 374, 104, 2016 |
| 4 |
Microstructural and elasto-plastic material parameters identification by inverse finite elements method of Ti(1-x)AlxN (0 < x < 1) sputtered thin films from Berkovich nano-indentation experiments
Pac MJ, Giljean S, Rousselot C, Richard F, Delobelle P
Thin Solid Films, 569, 81, 2014 |
| 5 |
Hard and relaxed a-SiNxHy films prepared by PECVD: Structure analysis and formation mechanism
Xu XD, He Q, Fan TJ, Jiang YD, Huang L, Ao TH, Ma CQ
Applied Surface Science, 264, 823, 2013 |
| 6 |
Humidity resistant hydrogenated carbon nitride films
Mikmekova E, Polcak J, Sobota J, Mullerova I, Perina V, Caha O
Applied Surface Science, 275, 7, 2013 |
| 7 |
Carbon nitride films by RF plasma assisted PLD: Spectroscopic and electronic analysis
Cappelli E, Orlando S, Trucchi DM, Bellucci A, Valentini V, Mezzi A, Kaciulis S
Applied Surface Science, 257(12), 5175, 2011 |
| 8 |
Micro-structural and optical properties of reactive magnetron sputtered Aluminum Nitride (AlN) nanostructured films
Subramanian B, Swaminathan V, Jayachandran M
Current Applied Physics, 11(1), 43, 2011 |
| 9 |
Characterisation of nano-structured titanium and aluminium nitride coatings by indentation, transmission electron microscopy and electron energy loss spectroscopy
Girleanu M, Pac MJ, Louis P, Ersen O, Werckmann J, Rousselot C, Tuilier MH
Thin Solid Films, 519(18), 6190, 2011 |
| 10 |
Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas
Niu JH, Zhang LL, Zhang ZH, Liu DP, Liu YH, Feng ZQ
Applied Surface Science, 256(22), 6887, 2010 |
