검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Highly sensitive positive-working molecular resist based on new molecule Hattori S, Yamada A, Saito S, Asakawa K, Koshiba T, Nakasugi T Journal of Vacuum Science & Technology B, 27(5), 2138, 2009 |
| 2 |
Electron-beam direct writing system employing character projection exposure with production dispatching rule Tominaga T, Nakamae K, Matsuo T, Fujioka H, Nakasugi T, Tawarayama K Journal of Vacuum Science & Technology B, 23(6), 2780, 2005 |
| 3 |
Maskless lithography using low-energy electron beam: Recent results for proof-of-concept system Nakasugi T, Ando A, Inanami R, Sasaki N, Ota J, Nagano O, Yamazaki Y, Sugihara K, Mori I, Miyoshi M, Okumura K Journal of Vacuum Science & Technology B, 20(6), 2651, 2002 |
| 4 |
Alignment system using voltage contrast images for low-energy electron-beam lithography Nakasugi T, Ando A, Sugihara K, Yamazaki Y, Miyoshi M, Okumura K Journal of Vacuum Science & Technology B, 19(6), 2869, 2001 |
| 5 |
Nanofabrication Techniques for a 100 nm-Scale Tungsten Polycide Gate Structure Azuma T, Nakasugi T, Oogi S, Takigami Y, Oyamatsu H Journal of Vacuum Science & Technology B, 11(6), 2123, 1993 |