화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Depth profiling of organic materials using improved ion beam conditions
Cramer HG, Grehl T, Kollmer F, Moellers R, Niehuis E, Rading D
Applied Surface Science, 255(4), 966, 2008
2 Application of TOF-SIMS for high precision ion implant dosimetry: Possibilities and limitations
Grehl T, Mollers R, Niehuis E, Rading D
Applied Surface Science, 255(4), 1404, 2008
3 Chemical effects in C-60 irradiation of polymers
Mollers R, Tuccitto N, Torrisi V, Niehuis E, Licciardello A
Applied Surface Science, 252(19), 6509, 2006
4 Influence of primary ion bombardment conditions on the emission of molecular secondary ions
Kersting R, Hagenhoff B, Kollmer F, Mollers R, Niehuis E
Applied Surface Science, 231-2, 261, 2004
5 Low energy dual beam depth profiling: influence of sputter and analysis beam parameters on profile performance using TOF-Sims
Grehl T, Mollers R, Niehuis E
Applied Surface Science, 203, 277, 2003
6 Secondary ion mass spectrometry depth profiling of ultralow-energy ion implants : Problems and solutions
van Berkum JGM, Collart EJH, Weemers K, Gravesteijn DJ, Iltgen K, Benninghoven A, Niehuis E
Journal of Vacuum Science & Technology B, 16(1), 298, 1998
7 Optimized Time-of-Flight Secondary-Ion Mass-Spectroscopy Depth Profiling with a Dual-Beam Technique
Iltgen K, Bendel C, Benninghoven A, Niehuis E
Journal of Vacuum Science & Technology A, 15(3), 460, 1997
8 Quantification of Metal Trace Contaminants on Si Wafer Surfaces by Laser-SNMS and ToF-SIMS Using Sputter-Deposited Submonolayer Standards
Schnieders A, Mollers R, Terhorst M, Cramer HG, Niehuis E, Benninghoven A
Journal of Vacuum Science & Technology B, 14(4), 2712, 1996