화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Advantage of plasma-less deposition in Cat-CVD to the performance of electronic devices
Matsumura H, Hasegawa T, Nishizaki S, Ohdaira K
Thin Solid Films, 519(14), 4568, 2011
2 Thin-film polycrystalline silicon solar cells formed by flash lamp annealing of a-Si films
Endo Y, Fujiwara T, Ohdaira K, Nishizaki S, Nishioka K, Matsumura H
Thin Solid Films, 518(17), 5003, 2010
3 Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealing
Ohdaira K, Shiba K, Takemoto H, Fujiwara T, Endo Y, Nishizaki S, Jang YR, Matsumura H
Thin Solid Films, 517(12), 3472, 2009
4 Comparison of a-Si TFTs fabricated by Cat-CVD and PECVD methods
Nishizaki S, Ohdaira K, Matsumura H
Thin Solid Films, 517(12), 3581, 2009
5 All hot wire CVD TFTs with high deposition rate silicon nitride (3 nm/s)
Schropp REI, Nishizaki S, Houweling ZS, Verlaan V, van der Werf CHM, Matsumura H
Solid-State Electronics, 52(3), 427, 2008
6 Poly-Si films with long carrier lifetime prepared by rapid thermal annealing of Cat-CVD amorphous silicon thin films
Ohdaira K, Abe Y, Fukuda M, Nishizaki S, Usami N, Nakajima K, Karasawa T, Torikai T, Matsumura H
Thin Solid Films, 516(5), 600, 2008
7 Superconductivity in a Layered Perovskite Without Copper
Maeno Y, Hashimoto H, Yoshida K, Nishizaki S, Fujita T, Bednorz JG, Lichtenberg F
Nature, 372(6506), 532, 1994