검색결과 : 6건
No. | Article |
---|---|
1 |
Etch characteristics of HfO2 films on Si substrates Norasetthekul S, Park PY, Baik KH, Lee KP, Shin JH, Jeong BS, Shishodia V, Norton DP, Pearton ST Applied Surface Science, 187(1-2), 75, 2002 |
2 |
Comparison of plasma etch chemistries for MgO Baik KH, Park PY, Gila BP, Shin JH, Abernathy CR, Norasetthekul S, Luo B, Ren F, Lambers ES, Pearton SJ Applied Surface Science, 183(1-2), 26, 2001 |
3 |
Dry etch chemistries for TiO2 thin films Norasetthekul S, Park PY, Baik KH, Lee KP, Shin JH, Jeong BS, Shishodia V, Lambers ES, Norton DP, Pearton SJ Applied Surface Science, 185(1-2), 27, 2001 |
4 |
Wet and dry etching of Sc2O3 Park PY, Norasetthekul S, Lee KP, Baik KH, Gila BP, Shin JH, Abernathy CR, Ren F, Lambers ES, Pearton SJ Applied Surface Science, 185(1-2), 52, 2001 |
5 |
Use of zirconium diboride copper as an electrode in plasma applications Norasetthekul S, Eubank PT, Bradley WL, Bozkurt B, Stucker B Journal of Materials Science, 34(6), 1261, 1999 |
6 |
Production of Polystyrene Particles via Aerosolization Norasetthekul S, Gadalla AM, Ploehn HJ Journal of Applied Polymer Science, 58(11), 2101, 1995 |