화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Etch characteristics of HfO2 films on Si substrates
Norasetthekul S, Park PY, Baik KH, Lee KP, Shin JH, Jeong BS, Shishodia V, Norton DP, Pearton ST
Applied Surface Science, 187(1-2), 75, 2002
2 Comparison of plasma etch chemistries for MgO
Baik KH, Park PY, Gila BP, Shin JH, Abernathy CR, Norasetthekul S, Luo B, Ren F, Lambers ES, Pearton SJ
Applied Surface Science, 183(1-2), 26, 2001
3 Dry etch chemistries for TiO2 thin films
Norasetthekul S, Park PY, Baik KH, Lee KP, Shin JH, Jeong BS, Shishodia V, Lambers ES, Norton DP, Pearton SJ
Applied Surface Science, 185(1-2), 27, 2001
4 Wet and dry etching of Sc2O3
Park PY, Norasetthekul S, Lee KP, Baik KH, Gila BP, Shin JH, Abernathy CR, Ren F, Lambers ES, Pearton SJ
Applied Surface Science, 185(1-2), 52, 2001
5 Use of zirconium diboride copper as an electrode in plasma applications
Norasetthekul S, Eubank PT, Bradley WL, Bozkurt B, Stucker B
Journal of Materials Science, 34(6), 1261, 1999
6 Production of Polystyrene Particles via Aerosolization
Norasetthekul S, Gadalla AM, Ploehn HJ
Journal of Applied Polymer Science, 58(11), 2101, 1995