| 1 |
A comparative study of charge trapping in HfO2/Al2O3 and ZrO2/Al2O3 based multilayered metal/high-k/oxide/Si structures
Spassov D, Skeparovski A, Paskaleva A, Novkovski N
Thin Solid Films, 614, 7, 2016 |
| 2 |
Light absorption mechanisms in sodium vanadium bronze thin films in electrochromic cells
Novkovski N, Najdoski M
Materials Chemistry and Physics, 148(3), 759, 2014 |
| 3 |
Charge trapping during constant current stress in Hf-doped Ta2O5 films sputtered on nitrided Si
Novkovski N, Atanassova E
Thin Solid Films, 519(7), 2262, 2011 |
| 4 |
Analysis of the improvement of Al-Ta2O5/SiO2-Si structures reliability by Si substrate plasma nitridation in N2O
Novkovski N
Thin Solid Films, 517(15), 4394, 2009 |
| 5 |
Stress-induced leakage currents of the RF sputtered Ta2O5 on N-implanted silicon
Novkovski N, Atanassova E, Paskaleva A
Applied Surface Science, 253(9), 4396, 2007 |
| 6 |
Wear-out of Al-Ta2O5/SiO2-Si structures under dynamic stress
Novkovski N, Atanassova E
Applied Surface Science, 252(10), 3833, 2006 |
| 7 |
Oxygen annealing modification of conduction mechanism in thin rf sputtered Ta2O5 on Si
Atanassova E, Novkovski N, Paskaleva A, Pecovska-Gjorgjevich M
Solid-State Electronics, 46(11), 1887, 2002 |
