| 1 |
Characterization of Ultrathin Polymer Films Using p-Polarized ATR-FTIR and Its Comparison with XPS
Luan PS, Oehrlein GS
Langmuir, 35(12), 4270, 2019 |
| 2 |
On the Interaction of Cold Atmospheric Pressure Plasma with Surfaces of Bio-molecules and Model Polymers
Bartis EAJ, Knoll AJ, Luan P, Seog J, Oehrlein GS
Plasma Chemistry and Plasma Processing, 36(1), 121, 2016 |
| 3 |
Influence of C4F8/Ar-based etching and H-2-based remote plasma ashing processes on ultralow k materials modifications
Kuo MS, Hua XF, Oehrlein GS, Ali A, Jiang P, Lazzeri P, Anderle M
Journal of Vacuum Science & Technology B, 28(2), 284, 2010 |
| 4 |
Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
Bruce RL, Lin T, Phaneuf RJ, Oehrlein GS, Bell W, Long B, Willson CG
Journal of Vacuum Science & Technology B, 28(4), 751, 2010 |
| 5 |
Mechanistic study of ultralow k-compatible carbon dioxide in situ photoresist ashing processes. I. Process performance and influence on ULK material modification
Kuo MS, Pal AR, Oehrlein GS, Lazzeri P, Anderle M
Journal of Vacuum Science & Technology B, 28(5), 952, 2010 |
| 6 |
Mechanistic study of ultralow k-compatible carbon dioxide in situ photoresist ashing processes. II. Interaction with preceding fluorocarbon plasma ultralow k etching processes
Kuo MS, Pal AR, Oehrlein GS, Hua XF
Journal of Vacuum Science & Technology B, 28(5), 961, 2010 |
| 7 |
Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
Weilnboeck F, Bruce RL, Engelmann S, Oehrlein GS, Nest D, Chung TY, Graves D, Li M, Wang D, Andes C, Hudson EA
Journal of Vacuum Science & Technology B, 28(5), 993, 2010 |
| 8 |
Surface and near-surface modifications of ultralow dielectric constant materials exposed to plasmas under sidewall-like conditions
Kuo MS, Oehrlein GS
Journal of Vacuum Science & Technology B, 28(6), 1104, 2010 |
| 9 |
Low-Temperature Plasma-Assisted Nanotransfer Printing between Thermoplastic Polymers
Lee DY, Hines DR, Stafford CM, Soles CL, Lin EK, Oehrlein GS
Advanced Materials, 21(24), 2524, 2009 |
| 10 |
Plasma-surface interactions of advanced photoresists with C4F8/Ar discharges: Plasma parameter dependencies
Engelmann S, Bruce RL, Sumiya M, Kwon T, Phaneuf R, Oehrlein GS, Andes C, Graves D, Nest D, Hudson EA
Journal of Vacuum Science & Technology B, 27(1), 92, 2009 |
