검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
The effects of dilution gas and pressure on the properties of PE-CVD low-k film Shioya Y, Kotake Y, Ishimaru T, Masubuchi T, Ikakura H, Ohgawara S, Maeda K Journal of the Electrochemical Society, 150(2), F1, 2003 |
| 2 |
Properties of low-k copper barrier SiOCH film deposited by PECVD using hexamethyldisiloxane and N2O Ishimaru T, Shioya Y, Ikakura H, Nozawa M, Ohgawara S, Ohdaira T, Suzuki R, Maeda K Journal of the Electrochemical Society, 150(5), F83, 2003 |