| 1 |
Advances in optical carrier profiling through high-frequency modulated optical reflectance
Bogdanowicz J, Dortu F, Clarysse T, Vandervorst W, Shaughnessy D, Salnik A, Nicolaides L, Opsal J
Journal of Vacuum Science & Technology B, 26(1), 310, 2008 |
| 2 |
Towards nondestructive carrier depth profiling
Clarysse T, Vandervorst W, Bakshi M, Nicolaides L, Salnik A, Opsal J
Journal of Vacuum Science & Technology B, 24(3), 1139, 2006 |
| 3 |
Nondestructive analysis of ultrashallow junction implant damage by combined technology of thermal wave and spectroscopic methods
Hovinen M, Opsal J
Journal of Vacuum Science & Technology B, 20(1), 431, 2002 |
| 4 |
Combined beam profile reflectometry, beam profile ellipsometry and ultraviolet-visible spectrophotometry for the characterization of ultrathin oxide-nitride-oxide films on silicon
Leng JM, Opsal J, Aspnes DE
Journal of Vacuum Science & Technology A, 17(2), 380, 1999 |
| 5 |
Optical monitoring of capacitance in hemispherical grain polycrystalline silicon for advanced dynamic random access memory application
Lee SB, Kim JO, Ritz KN, Opsal J, Oh HJ, Woo SH, Shin SW, Han IK, Yang HS
Journal of the Electrochemical Society, 145(11), 3935, 1998 |
| 6 |
Analytic representations of the dielectric functions of crystalline and amorphous Si and crystalline Ge for very large scale integrated device and structural modeling
Leng J, Opsal J, Chu H, Senko M, Aspnes DE
Journal of Vacuum Science & Technology A, 16(3), 1654, 1998 |
| 7 |
Broadband spectral operation of a rotating-compensator ellipsometer
Opsal J, Fanton J, Chen J, Leng J, Wei L, Uhrich C, Senko M, Zaiser C, Aspnes DE
Thin Solid Films, 313-314, 58, 1998 |
| 8 |
Analytic representations of the dielectric functions of materials for device and structural modeling
Leng J, Opsal J, Chu H, Senko M, Aspnes DE
Thin Solid Films, 313-314, 132, 1998 |
| 9 |
Simultaneous measurement of six layers in a silicon on insulator film stack using visible near IR spectrophotometry and single-wavelength beam profile reflectometry
Leng JM, Sidorowich JJ, Senko M, Opsal J
Thin Solid Films, 313-314, 270, 1998 |
| 10 |
Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectometry, beam profile ellipsometry and spectroscopic beam profile ellipsometry
Leng JM, Chen J, Fanton J, Senko M, Ritz K, Opsal J
Thin Solid Films, 313-314, 308, 1998 |
