검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Chemical Repair of Plasma Damaged Porous Ultra Low-kappa SiOCH Film Using a Vapor Phase Process Oszinda T, Schaller M, Schulz SE Journal of the Electrochemical Society, 157(12), II1140, 2010 |
| 2 |
Improved characterization of Fourier transform infrared spectra analysis for post-etched ultra-low-kappa SiOCH dielectric using chemometric methods Oszinda T, Beyer V, Schaller M, Fischer D, Bartsch C, Schulz SE Journal of Vacuum Science & Technology B, 27(1), 521, 2009 |