| 1 |
Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
Jhang PC, Lu CP, Shieh JY, Yang LW, Yang T, Chen KC, Lu CY
Solid-State Electronics, 133, 10, 2017 |
| 2 |
Universal dispersing agent for electrophoretic deposition of inorganic Materials with improved adsorption, triggered by chelating monomers
Liu YS, Luo D, Ata MS, Zhang TS, Wallar CJ, Zhitomirsky I
Journal of Colloid and Interface Science, 462, 1, 2016 |
| 3 |
Improvements in the reliability of a-InGaZnO thin-film transistors with triple stacked gate insulator in flexible electronics applications
Chen HM, Chang TC, Tai YH, Chen KF, Chiang HC, Liu KH, Lee CK, Lin WT, Cheng CC, Tu CH, Liu CY
Thin Solid Films, 595, 176, 2015 |
| 4 |
Study of charge loss mechanisms for nano-sized localized trapping SONOS memory devices
Xu Y, Yue H, Zhao FF
Solid-State Electronics, 91, 118, 2014 |
| 5 |
Field-dependent charge trapping analysis of ONO inter-poly dielectrics for NAND flash memory applications
Moon P, Lim JY, Youn TU, Park SK, Yun I
Solid-State Electronics, 94, 51, 2014 |
| 6 |
Thermal conductivity of hard oxynitride coatings
Bottger PHM, Lewin E, Patscheider J, Shklover V, Cahill DG, Ghisleni R, Sobiech M
Thin Solid Films, 549, 232, 2013 |
| 7 |
Segregation and morphology on the surface of ferritic stainless steel (001)
Fujiyoshi H, Matsui T, Yuhara J
Applied Surface Science, 258(19), 7664, 2012 |
| 8 |
Nitrogen modified metal oxide surfaces
Bertoti I
Catalysis Today, 181(1), 95, 2012 |
| 9 |
Oxide and nitride encapsulation of large-area graphene field effect devices
Al Imam S, Guermoune A, Siaj M, Szkopek T
Thin Solid Films, 520(24), 7041, 2012 |
| 10 |
Growth of yttria-doped zirconium oxide nitride single crystals by means of reactive skull melting
Berendts S, Lerch M
Journal of Crystal Growth, 336(1), 106, 2011 |
