| 1 |
Process conditions for complete decomposition of CHF3 in a dielectric barrier discharge reactor
Nguyen DB, Lee WG
Korean Journal of Chemical Engineering, 33(3), 844, 2016 |
| 2 |
비스페놀 A 수용액의 대기압 플라즈마 처리
조진오, 최경윤, 김수지, 목영선
Applied Chemistry for Engineering, 26(3), 311, 2015 |
| 3 |
Synthesis of structure controlled carbon nanomaterials by AC arc plasma process
Liu XY, Hong RY, Feng WG, Badami D
Powder Technology, 256, 158, 2014 |
| 4 |
Numerical simulation on the influence of water spray in thermal plasma treatment of CF4 gas
Kim TH, Choi S, Park DW
Current Applied Physics, 12(2), 509, 2012 |
| 5 |
Role of CH, CH3, and OH Radicals in Organic Compound Decomposition by Water Plasmas
Watanabe T, Narengerile, Nishioka H
Plasma Chemistry and Plasma Processing, 32(1), 123, 2012 |
| 6 |
Decomposition mechanism of phenol in water plasmas by DC discharge at atmospheric pressure
Narengerile, Yuan MH, Watanabe T
Chemical Engineering Journal, 168(3), 985, 2011 |
| 7 |
Characterization of CuO-ZnO Catalyst Prepared by Decomposition of Carbonates Using Dielectric-Barrier Discharge Plasma
Kuai PY, Liu CJ, Huo PP
Catalysis Letters, 129(3-4), 493, 2009 |
| 8 |
Effects of additives on the selectivity of byproducts and dry removal of fluorine for abating tetrafluoromethane in a discharge reactor
Tsai CH, Kuo ZZ
Journal of Hazardous Materials, 161(2-3), 1478, 2009 |
| 9 |
열플라즈마에 의한 클로로메탄의 분해
김정숙, 박동화
Journal of the Korean Industrial and Engineering Chemistry, 18(2), 136, 2007 |
| 10 |
High purity synthesis of carbon nanotubes by methane decomposition using an arc-jet plasma
Choi SI, Nam JS, Lee CM, Choi SS, Kim JI, Park JM, Hong SH
Current Applied Physics, 6(2), 224, 2006 |
