검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
5 kV multielectron beam lithography: MAPPER tool and resist process characterization Rio D, Constancias C, Martin M, Icard B, van Nieuwstadt J, Vijverberg J, Pain L Journal of Vacuum Science & Technology B, 28(6), C6C14, 2010 |
| 2 |
Study on line edge roughness for electron beam acceleration voltages from 50 to 5 kV Rio D, Constancias C, Saied M, Icard B, Pain L Journal of Vacuum Science & Technology B, 27(6), 2512, 2009 |
| 3 |
Resolution and total blur: Correlation and focus dependencies in e-beam lithography Keil K, Hauptmann M, Kretz J, Constancias C, Pain L, Bartha JW Journal of Vacuum Science & Technology B, 27(6), 2722, 2009 |
| 4 |
45 nm node back end of the line yield evaluation on ultrahigh density interconnect structures using electron beam direct write lithography Icard B, Pain L, Arnal V, Manakli S, Le-Denmat JC, Brun P, Vincent M, Soonkindt C, Minghetti B, Matsumiya T Journal of Vacuum Science & Technology B, 25(1), 124, 2007 |
| 5 |
Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight Pain L, Higgins C, Scarfogliere B, Tedesco S, Dal'Zotto B, Gourgon C, Ribeiro M, Kusumoto T, Suetsugu M, Hanawa R Journal of Vacuum Science & Technology B, 18(6), 3388, 2000 |