검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Chemical Mechanical Polishing of Ge Using Colloidal Silica Particles and H2O2 Peddeti S, Ong P, Leunissen LHA, Babu SV Electrochemical and Solid State Letters, 14(7), H254, 2011 |
| 2 |
Chemical Mechanical Polishing of Ge in Hydrogen Peroxide-Based Silica Slurries: Role of Ionic Strength Matovu JB, Penta NK, Peddeti S, Babu SV Journal of the Electrochemical Society, 158(11), H1152, 2011 |
| 3 |
Selective Chemical Mechanical Polishing of Silicon Dioxide over Silicon Nitride for Shallow Trench Isolation Using Ceria Slurries Veera PRD, Peddeti S, Babu SV Journal of the Electrochemical Society, 156(12), H936, 2009 |
| 4 |
Tartaric Acid as a Complexing Agent for Selective Removal of Tantalum and Copper in CMP Janjam SVSB, Peddeti S, Roy D, Babu SV Electrochemical and Solid State Letters, 11(12), H327, 2008 |