검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries Penta NK, Amanapu HP, Peethala BC, Babu SV Applied Surface Science, 283, 986, 2013 |
| 2 |
Chemical Mechanical Polishing of Ge in Hydrogen Peroxide-Based Silica Slurries: Role of Ionic Strength Matovu JB, Penta NK, Peddeti S, Babu SV Journal of the Electrochemical Society, 158(11), H1152, 2011 |
| 3 |
Role of Poly(diallyldimethylammonium chloride) in Selective Polishing of Polysilicon over Silicon Dioxide and Silicon Nitride Films Penta NK, Veera PRD, Babu SV Langmuir, 27(7), 3502, 2011 |
| 4 |
Novel phosphate-functionalized silica-based dispersions for selectively polishing silicon nitride over silicon dioxide and polysilicon films Dandu PRV, Penta NK, Peethala BC, Babu SV Journal of Colloid and Interface Science, 348(1), 114, 2010 |