검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants Merkulov A, Peres P, Choi S, Horreard F, Ehrke HU, Loibl N, Schuhmacher M Journal of Vacuum Science & Technology B, 28(1), C1C48, 2010 |
| 2 |
CAMECA IMS 7f-GEO: Specialized SIMS tool for geosciences Peres P, de Chambost E, Schuhmacher M Applied Surface Science, 255(4), 1472, 2008 |
| 3 |
Round-robin study of arsenic implant dose measurement in silicon by SIMS Simons D, Kim K, Benbalagh R, Bennett J, Chew A, Gehre D, Hasegawa T, Hitzman C, Ko J, Lindstrom R, MacDonald B, Magee C, Montgomery N, Peres P, Ronsheim P, Yoshikawa S, Schuhmacher M, Stockwell W, Sykes D, Tomita A, Toujou F, Won J Applied Surface Science, 252(19), 7232, 2006 |
| 4 |
Toward accurate in-depth profiling of As and P ultra-shallow implants by SIMS Merkulov A, de Chambost E, Schuhmacher M, Peres P Applied Surface Science, 231-2, 640, 2004 |
| 5 |
Latest developments for the CAMECA ULE-SIMS instruments: IMS Wf and SC-Ultra de Chambost E, Merkulov A, Peres P, Rasser B, Schuhmacher M Applied Surface Science, 231-2, 949, 2004 |
| 6 |
Molecular modeling and small angle X-ray scattering studies of Hoplosternum littorale cathodic haemoglobin Peres P, Lombardi FR, dos Santos GC, Olivieri JR, Canduri F, Bonilla-Rodriguez GO, de Azevedo WF Biochemical and Biophysical Research Communications, 325(2), 487, 2004 |
| 7 |
Accurate in depth profiling of As and P shallow implants by secondary ion mass spectroscopy de Chambost E, Merkulov A, Schuhmacher M, Peres P Journal of Vacuum Science & Technology B, 22(1), 341, 2004 |