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| No. | Article |
|---|---|
| 1 |
Spectroscopic Ellipsometric Monitoring of Electron-Cyclotron-Resonance Plasma-Etching of GaAs and AlGaAs Snyder PG, Ianno NJ, Wigert B, Pittal S, Johs B, Woollam JA Journal of Vacuum Science & Technology B, 13(6), 2255, 1995 |