화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn-Ta metal-sintered target
Muto Y, Nakatomi S, Oka N, Iwabuchi Y, Kotsubo H, Shigesato Y
Thin Solid Films, 520(10), 3746, 2012
2 Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems
Hirohata K, Nishi Y, Tsukamoto N, Oka N, Sato Y, Yamamoto I, Shigesato Y
Thin Solid Films, 518(11), 2980, 2010