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Synthesis and physical properties of poly(urethane)s using vicinal diols derived from acrylate and styrene monomers Akbulut H, Yoshida Y, Yamada S, Endo T Journal of Polymer Science Part A: Polymer Chemistry, 57(7), 799, 2019 |
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Synthesis of aliphatic polymers with high refractive index by photoinduced polyaddition of thiols to bifunctional allyl monomer containing tetrathiaspiro structure Aoyagi N, Endo T Journal of Polymer Science Part A: Polymer Chemistry, 57(11), 1160, 2019 |
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Inorganic-organic hybrid material coatings by using multifunctional epoxides and twin polymerization Hering W, Birkner M, Seifert A, Koecher R, Kretzschmar BSM, Marschner C, Gruenler B, Spange S Thin Solid Films, 669, 281, 2019 |
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Radical polyaddition of difunctional vinyloxirane with thiols for synthesis of linear and networked polysulfides Maeda S, Sudo A, Endo T Journal of Polymer Science Part A: Polymer Chemistry, 56(7), 783, 2018 |
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Synthesis of polydithiourethanes and their thermal, optical, and mechanical properties originated from monomers structure Yoshida Y, Endo T Journal of Polymer Science Part A: Polymer Chemistry, 56(19), 2255, 2018 |
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Partially Bio-Based Tri-and Hexaallyl Monomers: Synthesis from Naturally Occurring myo-Inositol and Polyaddition with Dithiols Sudo A, Shirakawa Y, Sakue T Journal of Polymer Science Part A: Polymer Chemistry, 55(9), 1524, 2017 |
7 |
Polyaddition of Azide-Containing Norbornene-Based Monomer through Strain-Promoted 1,3-Dipolar Cycloaddition Reaction Zhang XJ, Zhang Q, Wu YZ, Feng C, Xie C, Fan XD, Li PF Macromolecular Rapid Communications, 37(16), 1311, 2016 |
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Synthesis of thiourethanes and poly(thiourethane)s bearing carboxylic groups by nucleophilic acylation using cyclic acid anhydrides Inoue Y, Matsumoto K, Endo T Polymer Bulletin, 73(6), 1627, 2016 |
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Synthesis and Properties of Poly(thiourethane)s Having Soft Oligoether Segments Inoue Y, Matsumoto K, Endo T Journal of Polymer Science Part A: Polymer Chemistry, 53(9), 1076, 2015 |
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Synthesis of hyperbranched polyacetals via a(n)+b(2)-type polyaddition (n=3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography Kudo H, Matsubara S, Yamamoto H, Kozawa T Journal of Polymer Science Part A: Polymer Chemistry, 53(20), 2343, 2015 |