검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O-2 Inductively Coupled Plasma Lee J, Kim J, Efremov A, Kim C, Lee HW, Kwon KH Plasma Chemistry and Plasma Processing, 39(4), 1127, 2019 |
| 2 |
Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma Lim N, Efremov A, Kwon KH Thin Solid Films, 685, 97, 2019 |