검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Magnetron sputtering modes during pulsed deposition process determined by the analysis of power supply parameter Krowka K, Wiatrowski A, Posadowski WM Thin Solid Films, 520(12), 4127, 2012 |
| 2 |
Pulsed dc self-sustained magnetron sputtering Wiatrowski A, Posadowski WM, Radzimski ZJ Journal of Vacuum Science & Technology A, 26(5), 1277, 2008 |
| 3 |
Magnetron sputtering process control by medium-frequency power supply parameter Posadowski WM, Wiatrowski A, Dora J, Radzimski ZJ Thin Solid Films, 516(14), 4478, 2008 |
| 4 |
Self-sustained magnetron co-sputtering of Cu and Ni Posadowski WM Thin Solid Films, 459(1-2), 258, 2004 |
| 5 |
Plasma parameters of very high target power density magnetron sputtering Posadowski WM Thin Solid Films, 392(2), 201, 2001 |
| 6 |
Pulsed magnetron sputtering of reactive compounds Posadowski WM Thin Solid Films, 343-344, 85, 1999 |
| 7 |
Directional copper deposition using dc magnetron self-sputtering Radzimski ZJ, Posadowski WM, Rossnagel SM, Shingubara S Journal of Vacuum Science & Technology B, 16(3), 1102, 1998 |