검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Atomic Layer Deposition and Characterization of Bi2Te3 Thin Films Sarnet T, Hatanpaa T, Puukilainen E, Mattinen M, Vehkamaki M, Mizohata K, Ritala M, Leskela M Journal of Physical Chemistry A, 119(11), 2298, 2015 |
| 2 |
Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films Kaipio M, Blanquart T, Tomczak Y, Niinisto J, Gavagnin M, Longo V, Wanzenbock HD, Pallem VR, Dussarrat C, Puukilainen E, Ritala M, Leskela M Langmuir, 30(25), 7395, 2014 |
| 3 |
Holmium and titanium oxide nanolaminates by atomic layer deposition Kukli K, Lu J, Link J, Kemell M, Puukilainen E, Heikkila M, Hoxha R, Tamm A, Hultman L, Stern R, Ritala M, Leskela M Thin Solid Films, 565, 165, 2014 |
| 4 |
Holmium titanium oxide thin films grown by atomic layer deposition Kukli K, Kemell M, Dimri MC, Puukilainen E, Tamm A, Stern R, Ritala M, Leskela M Thin Solid Films, 565, 261, 2014 |
| 5 |
Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants Hamalainen J, Puukilainen E, Sajavaara T, Ritala M, Leskela M Thin Solid Films, 531, 243, 2013 |
| 6 |
Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen Kukli K, Kemell M, Puukilainen E, Aarik J, Aidla A, Sajavaara T, Laitinen M, Tallarida M, Sundqvist J, Ritala M, Leskela M Journal of the Electrochemical Society, 158(3), D158, 2011 |
| 7 |
Correlation Between Film Properties and Anhydrous HF Vapor Etching Behavior of Silicon Oxide Deposited by CVD Methods Ritala H, Kiihamaki J, Puukilainen E Journal of the Electrochemical Society, 158(6), D399, 2011 |
| 8 |
Liposomes for entrapping local anesthetics: A liposome electrokinetic chromatographic study Lokajova J, Laine J, Puukilainen E, Ritala M, Holopainen JM, Wiedmer SK Electrophoresis, 31(9), 1540, 2010 |
| 9 |
Growth and phase stabilization of HfO2 thin films by ALD using novel precursors Niinisto J, Mantymaki M, Kukli K, Costelle L, Puukilainen E, Ritala M, Leskela M Journal of Crystal Growth, 312(2), 245, 2010 |
| 10 |
Atomic layer deposition as pore diameter adjustment tool for nanoporous aluminum oxide injection molding masks Miikkulainen V, Rasilainen T, Puukilainen E, Suvanto M, Pakkanen TA Langmuir, 24(9), 4473, 2008 |