검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Characterization of pattern geometrical effect on line end shortening in x-ray lithography Yi M, Seo Y, Seo E, Yang J, Lee K, Choi BK, Kim O Journal of Vacuum Science & Technology B, 16(6), 3515, 1998 |
| 2 |
Edge diffraction enhanced printability in x-ray nanolithography Chen Y, Simon G, Haghiri-Gosnet AM, Carcenac F, Decanini D, Rousseaux F, Launois H Journal of Vacuum Science & Technology B, 16(6), 3521, 1998 |
| 3 |
Enhanced adhesion buffer layer for deep x-ray lithography using hard x rays De Carlo F, Song JJ, Mancini DC Journal of Vacuum Science & Technology B, 16(6), 3539, 1998 |
| 4 |
Prevention of Resist Pattern Collapse by Resist Heating During Rinsing Tanaka T, Morigami M, Oizumi H, Soga T, Ogawa T, Murai F Journal of the Electrochemical Society, 141(12), L169, 1994 |
| 5 |
Performance of a Wide-Field Flux Delivery System for Synchrotron X-Ray-Lithography Silverman JP, Archie CN, Oberschmidt JM, Rippstein RP Journal of Vacuum Science & Technology B, 11(6), 2976, 1993 |