검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target Schriever G, Bergmann K, Lebert R Journal of Vacuum Science & Technology B, 17(5), 2058, 1999 |
| 2 |
Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography Cardinale GF, Henderson CC, Goldsmith JEM, Mangat PJS, Cobb J, Hector SD Journal of Vacuum Science & Technology B, 17(6), 2970, 1999 |
| 3 |
Fabrication and Analysis of Extreme-Ultraviolet Reflection Masks with Patterned W/C Absorber Bilayers Voorma HJ, Louis E, Koster NB, Bijkerk F, Zijlstra T, Degroot LE, Rousseeuw BA, Romijn J, Vanderdrift EW, Friedrich J Journal of Vacuum Science & Technology B, 15(2), 293, 1997 |
| 4 |
Minimum critical defects in extreme-ultraviolet lithography masks Lin Y, Bokor J Journal of Vacuum Science & Technology B, 15(6), 2467, 1997 |
| 5 |
Printability of Substrate and Absorber Defects on Extreme-Ultraviolet Lithographic Masks Nguyen KB, Raychaudhuri AK, Stulen RH, Krenz K, Fetter LA, Tennant DM, Windt DL Journal of Vacuum Science & Technology B, 13(6), 3082, 1995 |
| 6 |
Characterization of an Expanded-Field Schwarzschild Objective for Extreme-Ultraviolet Lithography Kubiak GD, Tichenor DA, Raychaudhuri AK, Malinowski ME, Stulen RH, Haney SJ, Berger KW, Nissen RP, Wilkerson GA, Paul PH, Bjorkholm JE, Fetter LA, Freeman RR, Himel MD, Macdowell AA, Tennant DM, Wood OR, Waskiewicz WK, White DL, Windt DL, Jewell TE Journal of Vacuum Science & Technology B, 12(6), 3820, 1994 |
| 7 |
Imaging of Extreme-Ultraviolet Lithographic Masks with Programmed Substrate Defects Nguyen KB, Mizota T, Haga T, Kinoshita H, Attwood DT Journal of Vacuum Science & Technology B, 12(6), 3833, 1994 |