화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon-Silane Plasmas
Larriba-Andaluz C, Girshick SL
Plasma Chemistry and Plasma Processing, 37(1), 43, 2017
2 Pulsed and continuous wave plasma deposition of amorphous, hydrogenated silicon carbide from SiH4/CH4 plasmas
McCurdy PR, Truitt JM, Fisher ER
Journal of Vacuum Science & Technology A, 17(5), 2475, 1999
3 Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures
Agraharam S, Hess DW, Kohl PA, Allen SAB
Journal of Vacuum Science & Technology A, 17(6), 3265, 1999
4 Experimental Check of the High-Frequency Behavior of the Electrons in Molecular and Atomic Gas Plasmas
Gundermann S, Winkler R
Plasma Chemistry and Plasma Processing, 17(3), 263, 1997