| 1 |
Mapping of the electronic work function anisotropy of RF sputtered molybdenum thin film electrodes for piezoelectric devices
Sharma N, Kumar R, Jayabalan J
Current Applied Physics, 21, 58, 2021 |
| 2 |
The effects of substrate temperatures on the electrical properties of CaZrO3 thin films prepared by RF magnetron sputtering
He Q, Zhang Y, Chen XY, Wang Z, Ji H, Ding MJ, Xie B, Yu P
Current Applied Physics, 20(4), 557, 2020 |
| 3 |
Photocatalytic water splitting using hygroscopic MgO modified TiO2/WO3 dual-layer photocatalysts
Huang CW, Liao CH, Wu JCS
Korean Journal of Chemical Engineering, 37(8), 1352, 2020 |
| 4 |
RF Magnetron Sputtering공정에 의해 IT유리에 적층시킨 Silicon Nitride 박막의 특성
손정일, 김광수
Korean Journal of Materials Research, 30(4), 169, 2020 |
| 5 |
High SnS phase purity films produced by rapid thermal processing of RF-magnetron sputtered SnS2-x precursors
Sousa MG, da Cunha AF
Applied Surface Science, 472, 64, 2019 |
| 6 |
Luminescent Ta doped WO3 thin films as a probable candidate for excitonic solar cell applications
Kavitha VS, Suresh S, Chalana SR, Pillai VPM
Applied Surface Science, 466, 289, 2019 |
| 7 |
Biocompatibility study of multi-layered hydroxyapatite coatings synthesized on Ti-6Al-4V alloys by RF magnetron sputtering for prosthetic-orthopaedic implant applications
Hamdi DA, Jiang ZT, No K, Rahman MM, Lee PC, Truc LNT, Kim J, Altarawneh M, Thair L, Jumaa TAJ, Dlugogorski BZ
Applied Surface Science, 463, 292, 2019 |
| 8 |
Influence of tantalum on mechanical, ferroelectric and dielectric properties of Bi-excess Bi3.25La0.75Ti3O12 thin film
Ma S, Cheng XW, Ali T, Ma ZL, Xu ZJ, Chu RQ
Applied Surface Science, 463, 1141, 2019 |
| 9 |
Physical properties of rf-sputtered ZnS and ZnSe thin films used for double-heterojunction ZnS/ZnSe/CdTe photovoltaic structures
Toma O, Ion L, Iftimie S, Antohe VA, Radu A, Raduta AM, Manica D, Antohe S
Applied Surface Science, 478, 831, 2019 |
| 10 |
The influence of crystal structure and the enhancement of mechanical and frictional properties of titanium nitride film by addition of ruthenium
Ju HB, Ding N, Xu JH, Yu LH, Geng YX, Ahmed F, Zuo B, Shao L
Applied Surface Science, 489, 247, 2019 |
