검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Plasma doping implant depth profile calculation based on ion energy distribution measurements Godet L, Fang Z, Radovanov S, Walther S, Arevalo E, Lallement F, Scheuer JT, Miller T, Lenoble D, Cartry G, Cardinaud C Journal of Vacuum Science & Technology B, 24(5), 2391, 2006 |