| 1 |
Reaction Mechanism Studies on Atomic Layer Deposition of Nb2O5 from Nb(OEt)(5) and Water
Knapas K, Rahtu A, Ritala M
Langmuir, 26(2), 848, 2010 |
| 2 |
Atomic layer deposition of ultrathin copper metal films from a liquid copper(I) amidinate precursor
Li ZW, Rahtu A, Gordon RG
Journal of the Electrochemical Society, 153(11), C787, 2006 |
| 3 |
Radical-enhanced atomic layer deposition of metallic copper thin films
Niskanen A, Rahtu A, Sajavaara T, Arstila K, Ritala M, Leskela M
Journal of the Electrochemical Society, 152(1), G25, 2005 |
| 4 |
In situ reaction mechanism studies on the atomic layer deposition of Al2O3 from (CH3)(2)AlCl and water
Matero RA, Rahtu A, Ritala M
Langmuir, 21(8), 3498, 2005 |
| 5 |
In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)(2) and water
Niinisto J, Rahtu A, Putkonen M, Ritala M, Leskela M, Niinisto L
Langmuir, 21(16), 7321, 2005 |
| 6 |
Reaction mechanism studies on atomic layer deposition of ruthenium and platinum
Aaltonen T, Rahtu A, Ritala M, Leskela M
Electrochemical and Solid State Letters, 6(9), C130, 2003 |
| 7 |
Synthesis and characterization of volatile, thermally stable, reactive transition metal amidinates
Lim BS, Rahtu A, Park JS, Gordon RG
Inorganic Chemistry, 42(24), 7951, 2003 |
| 8 |
Atomic layer deposition of transition metals
Lim BS, Rahtu A, Gordon RG
Nature Materials, 2(11), 749, 2003 |
| 9 |
Reaction mechanism studies on the atomic layer deposition of ZrxTiyOz using the novel metal halide-metal alkoxide approach
Rahtu A, Ritala M
Langmuir, 18(25), 10046, 2002 |
| 10 |
In situ quartz crystal microbalance and quadrupole mass spectrometry studies of atomic layer deposition of aluminum oxide from trimethylaluminum and water
Rahtu A, Alaranta T, Ritala M
Langmuir, 17(21), 6506, 2001 |
