| 1 |
High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures
Rasappa S, Hulkkonen H, Schulte L, Ndoni S, Reuna J, Salminen T, Niemi T
Journal of Colloid and Interface Science, 534, 420, 2019 |
| 2 |
Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography
Borah D, Rasappa S, Salaun M, Zellsman M, Lorret O, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA
Advanced Functional Materials, 25(22), 3425, 2015 |
| 3 |
A facile route to synthesis of S-doped TiO2 nanoparticles for photocatalytic activity
McManamon C, O'Connell J, Delaney P, Rasappa S, Holmes JD, Morris MA
Journal of Molecular Catalysis A-Chemical, 406, 51, 2015 |
| 4 |
Study of the Kinetics and Mechanism of Rapid Self-Assembly in Block Copolymer Thin Films during Solvo-Microwave Annealing
Mokarian-Tabari P, Cummins C, Rasappa S, Simao C, Torres CMS, Holmes JD, Morris MA
Langmuir, 30(35), 10728, 2014 |
| 5 |
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions
Borah D, Rasappa S, Senthamaraikannan R, Shaw MT, Holmes JD, Morris MA
Journal of Colloid and Interface Science, 393, 192, 2013 |
| 6 |
Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems
Borah D, Ozmen M, Rasappa S, Shaw MT, Holmes JD, Morris MA
Langmuir, 29(9), 2809, 2013 |
| 7 |
Depth Profiling of PLGA Copolymer in a Novel Biomedical Bilayer Using Confocal Raman Spectroscopy
McManamon C, Delaney P, Kavanagh C, Wang JJ, Rasappa S, Morris MA
Langmuir, 29(19), 5905, 2013 |
| 8 |
Tuning PDMS Brush Chemistry by UV-O-3 Exposure for PS-b-PDMS Microphase Separation and Directed Self-assembly
Borah D, Rasappa S, Senthamaraikannan R, Holmes JD, Morris MA
Langmuir, 29(28), 8959, 2013 |
| 9 |
Block copolymer lithography: Feature size control and extension by an over-etch technique
Rasappa S, Borah D, Senthamaraikannan R, Faulkner CC, Shaw MT, Gleeson P, Holmes JD, Morris MA
Thin Solid Films, 522, 318, 2012 |
