검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Pathway to depositing device-quality 50 degrees C silicon nitride in a high-density plasma system Farber DG, Bae S, Okandan M, Reber DM, Kuzma T, Fonash SJ Journal of the Electrochemical Society, 146(6), 2254, 1999 |
| No. | Article |
|---|---|
| 1 |
Pathway to depositing device-quality 50 degrees C silicon nitride in a high-density plasma system Farber DG, Bae S, Okandan M, Reber DM, Kuzma T, Fonash SJ Journal of the Electrochemical Society, 146(6), 2254, 1999 |