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| No. | Article |
|---|---|
| 1 |
Performance improvements of tungsten and zinc doped indium oxide thin film transistor by fluorine based double plasma treatment with a high-K gate dielectric Ruan DB, Liu PT, Chiu YC, Yu MC, Gan KJ, Chien TC, Chen YH, Kuo PY, Sze SM Thin Solid Films, 665, 117, 2018 |