검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
CdS/ZnS 양자점 기반 플라스틱 섬광체 제작 및 성능평가 민수정, 강하라 , 이병채, 서범경, 정재학, 노창현, 홍상범 Korean Chemical Engineering Research, 59(3), 450, 2021 |
| 2 |
Quaternary PtRuFeCo nanoparticles supported N-doped graphene as an efficient bifunctional electrocatalyst for low-temperature fuel cells Rethinasabapathy M, Kang SM, Haldorai Y, Jonna N, Jankiraman M, Lee GW, Jang SC, Natesan B, Roh CH, Huh YS Journal of Industrial and Engineering Chemistry, 69, 285, 2019 |
| 3 |
Correlation between pit formation and phase separation in thick InGaN film on a Si substrate Woo H, Jo Y, Kim J, Cho S, Roh CH, Lee JH, Kim H, Hahn CK, Im H Current Applied Physics, 18(12), 1558, 2018 |
| 4 |
Phase separation suppression in InxGa1-xN on a Si substrate using an indium modulation technique Woo H, Jo H, Kim J, Cho S, Jo Y, Roh CH, Lee JH, Seo Y, Park J, Kim H, Hahn CK, Im H Current Applied Physics, 17(8), 1142, 2017 |
| 5 |
Barrier lowering and leakage current reduction in Ni-AlGaN/GaN Schottky diodes with an oxygen-treated GaN cap layer Woo H, Lee J, Jo Y, Han J, Kim J, Kim H, Roh CH, Lee JH, Park J, Hahn CK, Im H Current Applied Physics, 15(9), 1027, 2015 |
| 6 |
Effect of Pt and Ti on Ni/Ag/(Pt or Ti)/Au p-ohmic contacts of GaN based flip-chip LEDs Song HJ, Roh CH, Choi HG, Ha MW, Hahn CK, Park JH, Lee JH Applied Surface Science, 257(18), 8102, 2011 |
| 7 |
Quantum confinement effect of nanocrystalline GaN films prepared by pulsed-laser ablation under various Ar pressures Yoon JW, Sasaki T, Roh CH, Shim SH, Shim KB, Koshizaki N Thin Solid Films, 471(1-2), 273, 2005 |
| 8 |
The effect of metallic catalysts on the synthesis of GaN micro-crystals Roh CH, Park YJ, Kim EK, Shim KB Journal of Crystal Growth, 237, 926, 2002 |
| 9 |
Defect generation in multi-stacked InAs quantum dot/GaAs structures Roh CH, Park YJ, Kim KM, Park YM, Kim EK, Shim KB Journal of Crystal Growth, 226(1), 1, 2001 |
| 10 |
Poly(t-butyl-3 alpha-(5-norbomene-2-carbonyloxy)-7 alpha,12 alpha-dihydroxy-5 beta-cholan-24-oate-co-maleic anhydride) for a 193-nm photoresist Kim JB, Lee BW, Kang JS, Seo DC, Roh CH Polymer, 40(26), 7423, 1999 |