검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Influences of deposition and crystallization kinetics on the properties of silicon films deposited by low-pressure chemical vapour deposition from silane and disilane Temple-Boyer P, Rousset B, Scheid E Thin Solid Films, 518(23), 6897, 2010 |
| 2 |
Properties of nitrogen doped silicon films deposited by low pressure chemical vapour deposition from disilane and ammonia Temple-Boyer P, Jalabert L, Couderc E, Scheid E, Fadel P, Rousset B Thin Solid Films, 414(1), 13, 2002 |
| 3 |
Residual stress in silicon films deposited by LPCVD from disilane Temple-Boyer P, Scheid E, Faugere G, Rousset B Thin Solid Films, 310(1-2), 234, 1997 |