화학공학소재연구정보센터
검색결과 : 102건
No. Article
1 Modeled optical properties of SiGe and Si layers compared to spectroscopic ellipsometry measurements
Kriso C, Triozon F, Delerue C, Schneider L, Abbate F, Nolot E, Rideau D, Niquet YM, Mugny G, Tavernier C
Solid-State Electronics, 129, 93, 2017
2 Spectral and barrier properties of heterocomposites based on poly (para-phenylene) disposed between the silicon films
Balabai RM, Zdeschyts AV, Lubenets AG
Molecular Crystals and Liquid Crystals, 639(1), 39, 2016
3 Electron mobility and spin lifetime enhancement in strained ultra-thin silicon films
Osintsev D, Sverdlov V, Selberherr S
Solid-State Electronics, 112, 46, 2015
4 Subband splitting and surface roughness induced spin relaxation in (001) silicon SOI MOSFETs
Osintsev D, Baumgartner O, Stanojevic Z, Sverdlov V, Selberherr S
Solid-State Electronics, 90, 34, 2013
5 Effects of high hydrogen dilution ratio on optical properties of hydrogenated nanocrystalline silicon thin films
Guo LQ, Ding JN, Yang JC, Cheng GG, Ling ZY, Yuan NY
Applied Surface Science, 257(23), 9840, 2011
6 Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film
Koga K, Matsunaga T, Nakamura WM, Nakahara K, Kawashima Y, Uchida G, Kamataki K, Itagaki N, Shiratani M
Thin Solid Films, 519(20), 6896, 2011
7 Oxidation of the surface of a thin amorphous silicon film
Silva AG, Pedersen K, Li ZSS, Morgen P
Thin Solid Films, 520(2), 697, 2011
8 용액 공정을 통한 도핑된 실리콘 나노입자의 합성과 특성
권하영, 임은희, 이성구, 이경균
Applied Chemistry for Engineering, 21(6), 694, 2010
9 The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD
Qin YL, Yan HQ, Li F, Qiao L, Liu QM, He DY
Applied Surface Science, 257(3), 817, 2010
10 Effect of Ar in the source gas on the microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD
Wang DS, Liu QM, Li F, Qin YL, Liu DQ, Tang ZG, Peng SL, He DY
Applied Surface Science, 257(4), 1342, 2010