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| No. | Article |
|---|---|
| 1 |
Dual-Plasma Reactor for Low-Temperature Deposition of Wide Band-Gap Silicon Alloys Etemadi R, Godet C, Perrin J, Drevillon B, Huc J, Parey JY, Rostaing JC, Coeuret F Journal of Vacuum Science & Technology A, 15(2), 320, 1997 |